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Published: 2026-09-28 20:04:35.082344 Category: Technology Type: Photo Model release: No
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Polymer Texture with Topographic Relief Pattern, Abstract Surface Design for Industrial Applications, Innovative Material Technology.

Contributor: ManuStockStudio
ID : 2208372009
TitleFilesize
Photo5504x3072


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Keywords
abstract design, engineering, manufacturing, closeup, industrial design, design element, grey background


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